Sputtering TargetMatsurf Technologies Inc is specialized at manufacturing customized planner, rotation, disk, and rectangular metal, oxide, nitride, fluoride, silicide, boride, sulfide, selenide, telluride, and carbide targets for magnetron sputtering, cathodic arc, and evaporation with high quality and competitive price. We used innovative plasma spray and/or HIP to make rotary targets.
Metal targets
High purity metal targets: high purity Titanium (Ti), Chromium (Cr), Zirconium (Zr), Vanadium (V), Niobium (Nb), Molybdenum (Mo), Tungsten (W), Silver (Ag), Copper (Cu), Tantalum (Ta), Aluminum (Al), Cobalt (Co), Nickel (Ni), Iridium (Ir), Platinum (Pt), Gold(Au), Hafnium (Hf), Silicon (Si), Ruthenium (Ru), Germanium (Ge), Barium (Ba), Samarium (Sm), Selenium (Se), Tellurium (Te), Indium (In), …
Rotary target: Developed a novel HIP process for monolithic rotary targets for W, Mo, V, Al, Cr, Ag, TI, Ni, Zr, Si, SiAl, Nb, and other material with extremely low oxygen level, high purity, and high density (>99.9%). We also supply rotary oxide targets, such as ITO, AZO, NbO, GZO, TiO2, SiO2, and ZnO. Rare earth metal targets: Yttrium(Y), Lanthanum(La), Cerium(Ce), Gadolinium(Gd), Scandium (Sc), Neodymium(Nd), Samarium(Sm), Europium(Eu), Dysprosium(Dy), Holmium(Ho), Erbium(Er) High purity Zr and Hf targets: It is challenge to obtain Zirconium (Zr) without Hf due to their chemical similarity. We developed a new process to purify Zr/Hf and obtain ultra high purity Zr targets without Hf for magnetron sputtering, cathodic arc, evaporation. Hf content in The Zr is below 0.03at%. They can also be used for medical implants and surgical instruments with Hf content <0.03%. We supply Zr and Hf rode, plate, tube, and wire. High purity Cr targets: We supply high purity Cr targets: 99.5, 99.9%, 99.95%, and 99.99% Alloy targets: AlSi target: 5-95 at% Al TiSi target: 0-25 at% Si TiAl target: 0-70 at% Al CrAl target: 0-90 at% Al CrAlSi target: 0-90 at% Al and 0-15 at% Si TiAlSi target: 0-90 at% Al and 0-15 at% Si CrMo target: 0-25 at%Mo TiW target: 0-25 at%W MoCu target: 0-50 at% Cu WCu target: 0-50 at% Cu CrSi target: 0-25 at% Si NiTi target: 5-95 at% Ni NbTi target: 5-95% Nb Oxide target
ITO, AZO, ZnO, SnO, In2O3, SiO2, MgO, TiO2, ZrO2, Cr2O3, WO3, Nb2O5, Y2O3, GeO, CeO2, Al2O3, Ta2O5, NbO, TiO2, Pr6O11, Nd2O3, Sm2O3, Eu2O3, Gd2O3, Tb4O7, Ho2O3, Cs2O3, Dy2O3, La2O3, Er2O3, Yb2O3, Lu2O3, Tm2O3, ATO, BeO, BaZrO3, BaSrTiO3, BaTiO3, BiFeO3, Bi3Fe5O12, Bi2O3, Bi4Ti3O12, CeO2, CrSiO, CuAlO2, InGaZnOx, InFe2O4, TZO, IZO, LaAlO3, LaMnO3 (LMO), LSMO, LaNiO3, LaNbO3, LaTiO3, LaVO3, PbTiO3, PbZrO3, PLZT, PZT, SrRuO3, SrTiO3, SrZrO3, GZO, YSZ...
Oxide target for Li ion battery: LiFePo4, LiV2O5, LiSi, LiCoO2, Li3PO4, LiMnPO4, AZO with 0.5-50%Al2O3, ... Nitride target
TiN, ZrN, Cr2N, NbN, TaN, WN, Si3N4, BN, AlN, GaN, Ge3N4, InN, FeN4, HfN, VN, Zn3N2 ...
Fluoride target
MgF2, CaF2, AlF3, CeF3, CsF, CrF3, DyF3, ErF3, HfF4, LiF, MnF2, SmF3, NaF, SrF2, TbF3, TiF, SnF2, YF3, ZnF2, ZrF4
Carbide target
BC, C, TiC, SiC, WC, Cr3C2, ZrC, NbC, B4C, TaC, VC …
Boride target
B, TiB2, CrB2, HfB2, MoB, ZrB2, CeB6, LaB6, FeB, MgB2, Mo2B5, Ni2B, TaB2
Sulfide target
MoS2, WS2, SiS2, ZrS2, TiS2, In2S3, TaS2, FeS, MnS, Cr2S3, CaS, CuS, SnS, ZnS, Sb2S3, CuSbS2, TeAsSiGe(40:35:18:7 at%), AsGeTeSeS(30:25:18:15:12 at%)
Selenide targetSb2Se3, Cu2Se, WSe2，Na2Se，CdSe，GaSe，InSe，PbSe, Ag2Se, ZnSe， CuSe, AlSe, P2Se5, CuSbSe2
Telluride targetCdTe， SbTe, PbTe, MnTe, ZnTe.
Sputtering target recycling
Evaporation material
Matsurf Technologies Inc is specialized at manufacturing high purity metal, oxide, nitride, fluoride, silicide, boride, sulfide, selenide, telluride, and carbide powders, pellets, shots, and chunks for evaporation.
High purity Barium metal: Barium piece/pellet (2-5mm, purity 99.9%) High purity Barium (Ba) pellet sealed in argon filled metal can: purity: 99.9%, Dimension: 2-5mm High purity metal powder/pellet/shot (2-5mm, purity 99.99%) Al Slug/Pellet/Wire: Purity: 99.99% and 99.999%. Dimension: Φ3*3mm, Φ6*6mm, and Φ1mm. Cu Slug/Pellet/Wire: Purity: 99.995% and 99.999%. Dimension: Φ2*10mm, Φ3*3mm, and Φ1mm. Au Slug/Pellet/Wire: Purity: 99.999%. Dimension: Φ3*3mm and Φ1mm. Ag Slug/Pellet/Wire: Purity: 99.99%. Dimension: Φ2*5mm and Φ1mm. Pt Slug/Pellet/Wire: Purity: 99.99%. Dimension: Φ3*3mm and Φ1mm. Ti Slug/Pellet/Wire: Purity: 99.995%. Dimension: Φ6*6mm and Φ1mm. Ni Slug/Pellet/Wire: Purity: 99.999%. Dimension: Φ6*6mm and Φ1mm. Rare earth oxide powder/pellet/shot (2-5mm, purity99.99%): TeO2, CeO2, Y2O3, ZrO2, WO, Al2O3, Ta2O5, NbO, TiO2, Pr6O11, Nd2O3, Sm2O3, Eu2O3, Nb2O5, Gd2O3, Tb4O7, Ho2O3, Cs2O3, Dy2O3, La2O3, Er2O3, Yb2O3, Lu2O3, Tm2O3, GaO ... Rare earth metallic shot/chunk/slug (2-5mm, purity 99.9-99.99999%): Se, In, As, S, Re, Mn, Co, Bi, Sn, Te, Ir, Gd, Dy, Tb, Ho, Pd, Pb, Rh, Sm, Eu, Lu, Yb, Pm, Cs, La, Er, Tm, Ga Sulfide powder/pellet/shot （2-5mm, purity 99.9-99.999%): SeS2, MnSe, TiS2, ZrS2, NbS2, MoS2, WS2, SiS2, TaS2, In2S3, FeS, MgS, MnS, Cr2S3, CaS, CuS, SnS, ultrahigh density ZnS (>3.6g/cm3), Sb2S3, HgS, Sb2S3, PbS, CdS, Bi2S3, As2S3, Ga2S3, CuSbS2, TeAsSiGe(40:35:18:7 at%), AsGeTeSeS(30:25:18:15:12 at%) Selenide powder/pellet/shot （2-5mm, purity 99.9-99.999%): Sb2Se3, As2Se3, Bi2Se3, CdSe, Cu2Se, Cu1.8Se, Ga2Se3, In2Se3, PbSe, MoSe2, NiSe, SnSe, WSe2，Na2Se，Ag2Se, ZnSe， CuSe, AlSe, P2Se5, CuSbSe2 Telluride powder/pellet/shot （2-5mm, purity 99.9-99.999%): Bi2Te3, As2Te3, CdTe，Cu2Te, GaTe, GeTe, Sb2Te3, GeTe, PbTe, MnTe,HgTe, Na2O3Te, SnTe, ZnTe. Other material powder/pellet/shot （2-5mm, purity 99.9-99.999%): In(OOCCH3)3, InSb, InAs, InBr, InBr3, InCl, InCl3, InCl3.xH2O, InF3, In2O3, InI, InI3, In(NO3)3.xH2O, In2(SO4)3, GaSb, GaAs, GaCl3, GaF3, GaI3, Ga2O3. Evaporation crucible Liner
Matsurf Technologies Inc supplies high quality Ti, Zr, Mo, W, Hf, graphite, boron nitride heating elements, fixing parts, and crucible liner, wire, boat, for evaporation and high temperature application in vacuum.
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high purity Cr, CrMo target, 99.99%
high purity (99.99%) Cr target
Zr target, 99.95% with Hf<0.03%
Si3N4 target
TiAl, Cu, Al, Ni target
TiAlSi target
Si rotation Target
monolithic W, V, Mo, Al, Cr, SiAl, NiV, AZO, ZnO, ITO, NbO HIP/spray rotation target
LaMnO3 (LMO) target, density >93%
AZO, ZnO, ITO target
Sb2Se3, CdTe, SbTe, CIGS target
Ti target
Barium metal pellet
V slug/branch crystal, 99.95%
Co pellet, 99.9-99.999%
Cu pellet, 99.995-99.9999%
Silver wire, 99.99%
Selenium Shot， 99.999%
Rare earth metal chunk, 99.99%
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Substrate materials
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Matsurf Technologies Inc supplies polished high quality crystalline substrates with different sizes for thin film and coating deposition.
single crystals and substrates: CeO2, Fe3O4, SnO2, Cu2O, Fe2O3, MnO, PrScO3, NdScO3, NdScO3, GdScO3, DyScO3, SrTiO3, MgO, LaAlO3, YSZ, LSAT, KTaO3, NdGaO3, LaSrAlO4, GdScO3, Fe doped SrTiO3, PMNT, GGG, BaTiO3, DyScO3, Nb:SrTiO3, SiC, Al2O3, ZnO, MgAl2O4, LiGaO2, LiAlO2, GaN, TiO2, VaCO3, SiO2, LiNbO3, LiTaO3, YAlO3, YVO4, CdTe, CdZnTe, Si, Ge, Al2O3, MgF2, BaF2, CaF2, LiF, PbWO4, Ce3+YAG, BGO, Bi12SiO20, Cu, NaCl. ITO coated glass with low electric resistance Polished quartz substrate Polished MgO (100) substrate Polished MgO (110) substrate Polished Al2O3 (1012) R-plane substrate Polished Al2O3 (0001) C-plane substrate Polished Si (100) substrate Polished Si (111) substrate Polished SrTiO3 (100) substrate Polished Nb doped SrTiO3 (100) substrate Ultra high density ZnS pellet
Matsurf Technologies Inc supplies ultrahigh density zinc sulfide (ZnS) pellet and target.
Purity: 99.99% Density: >3.6g/cm3 |
Si wafer
Quartz substrate
High purity Cr powder/flake, 99.5-99.99% |
